Spectroscopic Study of a Discharge-Pumped XeF Laser at High Resolution

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概要

• 論文の詳細を見る

• Using a transverse electric discharge, XeF laser spectra were investigated at high resolution under various lasing conditions, and new laser lines at 350 and 352 nm were found. Accurate wavelenghs for all laser lines and their relative intensities were determined. Correlation was found between laser pulse shapes and lasing lines suggesting different lasing mechanisms for the 351- and 353-nm groups. The best performance was obtained with a Blumlein-type apparatus consisting of a 0.8mm thick copper-clad fiberglass-epoxy laminated circuit board; the peak power at a total pressure of 500 Torr was 1.1 MW. It was easy to achieve lasing conditions for only the 351 nm group, in which case, the laser energy is concentrated in the vicinity of the strongest line at 3511.242 Å.

• 社団法人応用物理学会の論文
• 1978-03-05

著者

• Miura Tokiwa

  Faculty Of Engineering Meiji University

• Karasawa Shiro

  Institute Of Physics The Tsukuba University

• SHIMAUCHI Midori

  Insutitute for Optical Research, Tokyo Kyoiku University

• Shimauchi Midori

  Insutitute For Optical Research Tokyo Kyoiku University

関連論文

• Absorption Lines in the KrCl Laser Spectrum and the Spontaneous Emission of the Medium Related to KrCl
• Spectroscopic Study of a Discharge-Pumped XeF Laser at High Resolution

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