Semi-Insulating Polycrystalline-Silicon (SIPOS) Films Applied to MOS Integrated Circuits : A-2: DEVICE TECHNOLOGY (II)
スポンサーリンク
概要
著者
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ABE Motoaki
Semiconductor development Division
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Abe Motoaki
Semiconductoer Development Division Atsugi Plant Sony Corporation
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Ando Tetsuo
Semiconductoer Development Division Atsugi Plant Sony Corporation
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Aoki Teruaki
Semiconductor Division Atsugi Plant Sony Corporation
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Aoki Teruaki
Semiconductor Division Atsugi Plan Sony Corporation
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MOCHIZUKI Hidenobu
Semiconductoer Development Division, Atsugi Plant, SONY Corporation
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YAMOTO Hisayoshi
Semiconductor Division, Atsugi Plant, SONY Corporation
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OKAYAMA Masanori
Semiconductor Division, Atsugi Plant, SONY Corporation
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Okayama Masanori
Semiconductor Division Atsugi Plant Sony Corporation
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Okayama Masanori
Semiconductor Division Atsugi Plan Sony Corporation
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Yamoto Hisayoshi
Semiconductor Division Atsugi Plant Sony Corporation
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Mochizuki Hidenobu
Semiconductoer Development Division Atsugi Plant Sony Corporation
関連論文
- A 380H × 488V CCD Imager with Narrow Channel Transfer Gates : A-7: OTHER SILICON DEVICES
- Semi-Insulating Polycrystalline-Silicon (SIPOS) Films Applied to MOS Integrated Circuits : A-2: DEVICE TECHNOLOGY (II)
- Semi-Insulating Polycrystalline-Silicon (SIPOS) Passivation Technology : A-2: DEVICE TECHNOLOGY (II)