Semi-Insulating Polycrystalline-Silicon (SIPOS) Passivation Technology : A-2: DEVICE TECHNOLOGY (II)
スポンサーリンク
概要
著者
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Hayashi Hisao
Semiconductor Development Division Atsugi Plan Sony Corporation
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Aoki Teruaki
Semiconductor Division Atsugi Plan Sony Corporation
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OKAYAMA Masanori
Semiconductor Division, Atsugi Plant, SONY Corporation
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MATSUSHITA Takeshi
Semiconductor Development Division, Atsugi Plan, SONY Corporation
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OTSU Takaji
Semiconductor Development Division, Atsugi Plan, SONY Corporation
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YAMATO Hisayoshi
Semiconductor Division, Atsugi Plan, SONY Corporation
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KAWANA Yoshiyuki
Semiconductor Development Division, Atsugi Plan, SONY Corporation
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Otsu Takaji
Semiconductor Development Division Atsugi Plan Sony Corporation
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Kawana Yoshiyuki
Semiconductor Development Division Atsugi Plan Sony Corporation
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Yamato Hisayoshi
Semiconductor Division Atsugi Plan Sony Corporation
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Okayama Masanori
Semiconductor Division Atsugi Plan Sony Corporation
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Matsushita Takeshi
Semiconductor Development Division Atsugi Plan Sony Corporation
関連論文
- Semi-Insulating Polycrystalline-Silicon (SIPOS) Films Applied to MOS Integrated Circuits : A-2: DEVICE TECHNOLOGY (II)
- Semi-Insulating Polycrystalline-Silicon (SIPOS) Passivation Technology : A-2: DEVICE TECHNOLOGY (II)