0.12 μm Optical Lithography Performances Using an Alternating Deep UV Phase Shift Mask
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1998-12-30
著者
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SCHIAVONE Patrick
France Telecom, Centre National d'Etudes des Tilecommunications
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Schiavone Patrick
France Telecom-cnet-bp 98 38243 Meylan Cedex
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Buffet Nicolas
Leti (cea-technologies Avancees)-cea-g
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TROUILLER Yorick
LETI (CEA-Technologies Avancees)-CEA-G
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MOURIER Thierry
LETI (CEA-Technologies Avancees)-CEA-G
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QUERE Yves
LETI (CEA-Technologies Avancees)-CEA-G
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SCHIAVONE Patrick
France Telecom, Centre National d'Etudes des Tilecommunications
関連論文
- Application of Alternating-Type Phase Shift Mask to Polysilicon Level for Random Logic Circuits
- 0.12 μm Optical Lithography Performances Using an Alternating Deep UV Phase Shift Mask