Resolution Limit of Optical Disc Mastering

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概要

• 論文の詳細を見る

• With the increase of the information density on optical discs, it becomes increasingly necessary to improve the quality and the resolution of the optical disc mastering process, The obvious approach is to reduce the size of recorded structures by reducing the λ/NA ratio of the recorder. Indeed, mastering at UV wavelengths has been put into practice by several companies. This paper deals with an additional route towards higher resolution. It is shown that the combination of improved photoresist processes and better exposure techniques can lead to a clear reduction of the smallest achievable pit size. Combining such techniques with UV mastering, pit lengths below 200 nm should be well within reach of classical optical disc mastering.

• 社団法人応用物理学会の論文
• 1997-01-30

著者

• URBACH H.

  Philips Research

• PUT Paul

  Philips Research Laboratories

• MORTON Robert

  Philips Research Laboratories

• RUSCH Jurgen

  Philips Research Laboratories

• Put P

  Philips Research Laboratories

• Urbach H.Paul

  Philips Research Laboratories

関連論文

• Near Field Recording on First-Surface Write-Once Media with a NA = 1.9 Solid Immersion Lens
• Calculation of Fluorescence Intensities in Grazing-Emission X-Ray Fluorescence Spectrometry
• Resolution Limit of Optical Disc Mastering
• New Simulation for Wet and Dry Developable Photoresists
• Prototype Optical Tape Recorder
• Near Field Recording on First-Surface Write-Once Media with a $\mathrm{NA}=1.9$ Solid Immersion Lens

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