New Simulation for Wet and Dry Developable Photoresists

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概要

• 論文の詳細を見る

• Simulation programs can provide useful support for process understanding and the optimization of resist processes. Two new simulation programs and results are presented. One is 2 dimensional program based on solving the Maxwell equations which offers a rigorous solution for reflections on complex topograph and focus problems. And and this is for a single layer dry developable resist system.

• 社団法人応用物理学会の論文
• 1990-11-20

著者

• URBACH H.

  Philips Research

• Urbach H

  Philips Res. Lab. Eindhoven Nld

• TOL A.

  Philips Research Laboratories

• REUHMAN M.

  Philips Research Laboratories

• MAXWELL G.

  Philips Research Laboratories

• VISSER R.

  Philips Research Laboratories

関連論文

• Near Field Recording on First-Surface Write-Once Media with a NA = 1.9 Solid Immersion Lens
• Calculation of Fluorescence Intensities in Grazing-Emission X-Ray Fluorescence Spectrometry
• Resolution Limit of Optical Disc Mastering
• New Simulation for Wet and Dry Developable Photoresists
• Near Field Recording on First-Surface Write-Once Media with a $\mathrm{NA}=1.9$ Solid Immersion Lens

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