Simulation-Based Automatic Optical Proximity Effect Correction Adaptive for Device Fabrication
スポンサーリンク
概要
- 論文の詳細を見る
- 1997-12-30
著者
-
Ohnuma Hidetoshi
Process Development Department Semiconductor Company Sony Corporation
-
TSUDAKA Keisuke
Process Development Department, Semiconductor Company, Sony Corporation
-
KAWAHIRA Hiroichi
Process Development Department, Semiconductor Company, Sony Corporation
-
FURUMI Koji
Process Development Department, Semiconductor Company, Sony Corporation
-
Furumi Koji
Process Development Department Semiconductor Company Sony Corporation
-
Tsudaka Keisuke
Process Development Department Semiconductor Company Sony Corporation
-
Kawahira Hiroichi
Process Development Department Semiconductor Company Sony Corporation
関連論文
- Lithography Computer Aided Design Technology for Embedded Memory in Logic
- Simulation-Based Automatic Optical Proximity Effect Correction Adaptive for Device Fabrication
- Practical Optical Proximity Effect Correction Adopting Process Latitude Consideration
- New Systematic Evaluation Method for Attenuated Phase-Shifting Mask Specifications
- Evaluation of Phase-Shifting Masks for Dense Contact Holes Using the Exposure-Defocus and Mask Fabrication Latitude Methodology