Sub-1 /4-μm Periodic Patterns with Nd:YAG Laser and Image Transfer to Silicon Surface by Reactive Ion Etching
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概要
- 論文の詳細を見る
Quarter-micron linear and dot patterns were made on polyimide surface spin-coated onto silicon substrates with the Q-switched 4th-harmonic UV-pulses of Nd:YAG laser at 266 nm. Shallow polymer images were then trans-ferred to silicon substrates by successive reactive ion etchings of SF_6, 0_3 and SF_6-C_2ClF_5 after filling in valleys of ripples with poly(dimethylsiloxane). We were successful in fabricating 〜 100 nm silicon structures with vertical wall profiles. Because this process does not use any masks or scanning beam system, nanostructures can be formed on wide surface areas of polymers, silicon, GaAs, and other surfaces. The dimensions can be varied by varying the laser wavelength and geometrical arrangement.
- 社団法人応用物理学会の論文
- 1994-12-30
著者
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Hiraoka Hiroyuki
The Hong Kong University Of Science And Technology Department Of Chemistry
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Hiraoka Hiroyuki
The Hong Kong University Of Science Ad Technology Department Of Chemistry
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SENDOVA Mariana
The Hong Kong University of Science and Technology, Department of Chemistry
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LEE Cheng-Hao
The Hong Kong University of Science and Technology, Department of Chemistry
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Lee Cheng-hao
The Hong Kong University Of Science And Technology Department Of Chemistry
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Sendova Mariana
The Hong Kong University Of Science And Technology Department Of Chemistry
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SENDOVA Mariana
The Hong Kong University of Science ad Technology, Department of Chemistry
関連論文
- Sub-1 /4-μm Periodic Patterns with Nd:YAG Laser and Image Transfer to Silicon Surface by Reactive Ion Etching
- Sub-Half-Micron Periodic Structures on Polymer Surfaces with Polarized Laser Irradiation