Minimization of Residual Stress in SOI Films by Using AlN Interlaid Insulator

スポンサーリンク

概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1985-08-20

著者

• Ogura Atsushi

  Fundamental Research Laboratories Nec Corporation

• Egami Koji

  Fundamental Research Laboratories, NEC Corporation

• Kimura Masakazu

  Fundamental Research Laboratories, NEC Corporation

• Egami Koji

  Fundamental Research Laboratories Nec Corporation

• Kimura Masakazu

  Fundamental Research Laboratories Nec Corporation

関連論文

• Minimization of Residual Stress in SOI Films by Using AlN Interlaid Insulator
• Periodic Surface Energy Driven Single Crystallization on Flat Surface
• Device Layer Transfer Technique using Chemi-Mechanical Polishing

スポンサーリンク