Properties of ZnS Thin-Films Grown by Ionized-Cluster Beam Deposition
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概要
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The properties of ZnS thin-films grown by the ionized-cluster beam (ICB) deposition at a low substrate temperature have been investigated. The crystallinity of the deposited films is dependent on an accelerating voltage of ionized-clusters. It is found that a highly crystalline ZnS film can be grown at a relatively low substrate temperature of 13O℃ by optimizing the accelerating voltage.
- 社団法人応用物理学会の論文
- 1982-09-20
著者
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Ohkawa Yasushi
Fujitsu Laboratories Ltd.
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WAKITANI Masayuki
FUJITSU LABORATORIES LTD.
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MIURA Shoshin
FUJITSU LABORATORIES LTD.
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UMEDA Shozo
FUJITSU LABORATORIES LTD.
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Oki Ken'ichi
Fujitsu Laboratories Ltd.
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