Effect of Argon lon Bombardment on Internal Stress in Evaporated Co-Cr Film : Magnetism, Magnetic Materials and Devices

概要

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The amount of Ar in evaporated Co-Cr film increases linearly with increasing argon ion flux density divided by the deposition rate of Co-Cr. The tensile internal stress decreases and then becomes compressive as the amount of Ar increases. The average energy imparted to Co and Cr atoms by argon ion bombardment during deposition is estimated to be about 17 eV at the point at which tensile internal stress becomes compressive. This energy is about 100 times that imparted during vacuum deposition. The number of cracks decreases and the spacing of the (00・2) planes increases as the tensile internal stress decreases.
社団法人応用物理学会の論文
1988-05-20