Low-Temperature Surface Cleaning of GaAs by Electron Cyclotron Resonance (ECR) Plasma

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1989-01-20

著者

• Kondo Naoto

  Ntt Opto-electronics Laboratories

• Kondo Naoto

  Ntt Opto-electronics Labotarories

• NANISHI Yasushi

  NTT Opto-electronics Laboratories

• Nanishi Yasushi

  Ntt Opto-electronics Labotarories

関連論文

• A Rutherford Backscattering Spectroscopic Study of the Aluminum Antimonide Oxidation Process in Air
• Direct Growth of AlGaAs/GaAs Single Quantum Wells on GaAs Substrates Cleaned by Electron Cyclotron Resonance (ECR) Hydrogen Plasma
• Low-Temperature Surface Cleaning of GaAs by Electron Cyclotron Resonance (ECR) Plasma
• Surface Cleaning of AlGaAs Substrates by Hydrogen Electron Cyclotron Resonance (ECR) Plasma
• Low-Temperature Si Surface Cleaning by Hydrogen Beam with Electron-Cyclotron-Resonance Plasma Excitation
• Electrical Properties of AlGaAs/GaAs Two-Dimensional Electron Gases (2DEGs) Grown on GaAs Substrates Cleaned by an Electron Cyclotron Resonance (ECR) Hydrogen Plasma

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