Sputter-Deposition of Fe Films in a High Pressure Atmosphere
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概要
- 論文の詳細を見る
A sputtering apparatus in which sputtered atoms were carried from the target to the substrate by Ar gas flowing between them was developed by the author. Using it, iron films were deposited at a considerably high rate in a very high pressure atmosphere, and sputtered atoms could be completely thermalized before arriving at the substrate.
- 社団法人応用物理学会の論文
- 1987-06-20
著者
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Ishii Kiyoshi
Department Of Electrical Engineering Faculty Of Engineering Utsunomiya University
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Ishii Kiyoshi
Department Of Biology Dokkyo University School Of Medicine
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