Defect Filtering in GaAs on Si by Conformal Growth
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概要
- 論文の詳細を見る
Using a newly developed technique of conformal growth, we show that low defect density GaAs films can be obtained from MBE or MOVPE GaAs-coated Si heterostructures. The defect characterization of the conformally grown films has been carried out using transmission electron microscopy and chemical etching. For the first time dislocation densities below 10^5/cm^2 have been observed in submicron GaAs films grown on Si by vapor phase epitaxy.
- 社団法人応用物理学会の論文
- 1991-03-15
著者
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Collet C.
Thomson-csf Laboratoire Central De Recherches
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Dupuy M.
Leti
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Pribat D.
THOMSON-CSF, Laboratoire Central de Recherches
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Provendier V.
THOMSON-CSF, Laboratoire Central de Recherches
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Legagneux P.
CPM, BP 85X, Centre d'Etudes Nucleaires
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Pribat D.
Thomson Csf. Laboratoire Central De Recherches Domaine De Corbeville
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Provendier V.
Thomson-csf Laboratoire Central De Recherches:(present Address)e.n.s.m.p. Centres Des Materiaux Pierre-marie Fourt
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Legagneux P.
Cpm Bp 85x Centre D'etudes Nucleaires
関連論文
- Defect Filtering in GaAs on Si by Conformal Growth
- Structural Characterizations of Conformally Grown (100) Si Films