Quantum Chemical Analysis of Metal Adsorption Mechanism onto Silicon Surface in Cleaning Solution
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概要
- 論文の詳細を見る
- 1995-03-01
著者
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Matsushita Yoshiaki
Semiconductor Device Engineering Laboratory Toshiba Corporation
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Matsushita Yoshiaki
Semiconductor Materials Engineering Department Toshiba Corporation
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Tada Tsukasa
Research And Development Center Toshiba Corporation
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MIYASHITA Moriya
Semiconductor Materials Engineering Department, Toshiba Corporation
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KUBOTA Hiroyasu
Semiconductor Materials Engineering Department, Toshiba Corporation
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YOSHIMURA Reiko
Research and Development Center, Toshiba Corporation
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Kubota Hiroyasu
Semiconductor Materials Engineering Department Toshiba Corporation
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Miyashita M
Tohoku Univ. Sendai Jpn
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Yoshimura Reiko
Research And Development Center Toshiba Corporation
関連論文
- Quantum Chemical Analysis of Metal Adsorption Mechanism onto Silicon Surface in Cleaning Solution
- Electronic Structure of Vanadium Oxide Clusters in Layered Perovskite Compounds Sr_V_nO_(n=1,2,3)
- Photoluminescence Related to Dislocations in Annealed Czochralski-Grown Si Crystals