Emitter Material Comparison between InGaP and InGaAsP in GaAs-Based Heterojunction Bipolar Transistors
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概要
- 論文の詳細を見る
In_<0.49>Ga_<0.51>P (E_g=1.87 eV)/GaAs and In_<0.38>Ga_<0.62>As_<0.22>P_<0.78> (E_g=1.77 eV)/GaAs Npn heterojunction bipolar transistors (HBTs) were fabricated. In devices with 110 μm×110 μm emitter areas, the curtent gains of both devices were the same value of 14 at a collector current density of 700 A/cm^2. By contrast, the turn-on voltage of InGaAsP/GaAs HBTs was 0.01 V smaller than that of InGaP/GaAs HBTs, which indicated that the conduction band discontinuity of the InGaP/InGaAsP heterojunction was much smaller than the valence band discontinuity.
- 社団法人応用物理学会の論文
- 1994-07-15
著者
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OHKUBO Michio
Yokohama R & D Lab. The Furukawa Electric Co., Ltd.
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NINOMIYA Takao
Yokohama R & D Lab. The Furukawa Electric Co., Ltd.
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Ohkubo Michio
Yokohama R & D Laboratories The Furukawa Electric Co. Ltd.
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Ninomiya Takao
Yokohama R & D Laboratories The Furukawa Electric Co. Ltd.
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IKETANI Akira
Yokohama R & D Laboratories, The Furukawa Electric Co., Ltd.
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IKEDA Masakiyo
Yokohama R & D Laboratories, The Furukawa Electric Co., Ltd.
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Ikeda Masakiyo
Yokohama R & D Laboratories The Furukawa Electric Co. Ltd.
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Iketani Akira
Yokohama R & D Laboratories The Furukawa Electric Co. Ltd.
関連論文
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