Plasma-Enhanced Chemical Vapor Deposition of Silicon Nitride : Deposition
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1992-04-30
著者
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Kobayashi Izumi
Department Of Electro And Electronics Engineering Nippon Institute Of Technology
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Kobayashi I
Nippon Sanso Corp. Ibaraki Jpn
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KOBAYASHI Ikunori
Display Research Laboratory, Audio Video Research Center, Matsushita Electric Industrial Co., Ltd.
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OGAWA Tetsu
Display Research Laboratory, Audio Video Research Center, Matsushita Electric Industrial Co., Ltd.
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HOTTA Sadayoshi
Display Research Laboratory, Audio Video Research Center, Matsushita Electric Industrial Co., Ltd.
関連論文
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- Preparation of (111)-Oriented β-Ta_2O_5 Thin Films by Chemical Vapor Deposition Using Metalorganic Precursors
- Plasma-Enhanced Chemical Vapor Deposition of Silicon Nitride : Deposition
- Plasma-Enhanced Chemical Vapor Deposition of Silicon Nitride