A Feasibility Study on the Use of Amorphous Silicon as Optical Recording Medium

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概要

• 論文の詳細を見る

• We have shown that amorphous silicon (a-Si) prepared by the plasma enhanced chemical vapor deposition (PECVD) method underwent an 80 dB enhancement in transmission when subjected to heat treatment and laser annealing. As this characteristic has a high potential in the optical disk application, careful studies of contrast transmission with respect to annealing power density, sample film thickness, and probing wavelength are presentted. We further prove with Raman scattering that this enhancement is indeed due to the laser induced amorphous-to-crystalline phase transition.

• 社団法人応用物理学会の論文
• 1987-02-20

著者

• Huang Chien-rong

  Institute Of Electro-optical Engineering National Chiao Tung University

• LEE Ming-Chiln

  Institute of Electro-Optical Engineering, National Chiao Tung University

• TSENG Chau-Jern

  Institute of Electro-Optical Engineering, National Chiao Tung University

• HUANG Tzer-Hsiang

  Institute of Electro-Optical Engineering, National Chiao Tung University

• Lee Ming-chiln

  Institute Of Electro-optical Engineering National Chiao Tung University

• Tseng Chau-jern

  Institute Of Electro-optical Engineering National Chiao Tung University

• Huang T‐h

  National Cheng Kung Univ. Tainan Twn

• Huang Tzer-hsiang

  Institute Of Electro-optical Engineering National Chiao Tung University

関連論文

• A Feasibility Study on the Use of Amorphous Silicon as Optical Recording Medium
• Electroabsorption Spectra of the Vanadyl Phthalocyanine Films

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