Reduction and Sintering of Vanadium Oxide Films by Laser-Beam Irradiation
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概要
- 論文の詳細を見る
V_2O_5 films printed on alumina substrates were reduced and sintered to form film devices by a 2 ms irradiation process using a beam from a relaxation-oscillating ruby laser in an air atmosphere. These devices possess electrical characteristics of a metal-semiconductor transition at 68℃, referred to as VO_2. Their X-ray powder diffraction patterns prove that they consist mainly of VO_2. This process is useful for making a VO_2 element at a specified location on a device.
- 社団法人応用物理学会の論文
- 1987-10-20
著者
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Sasaki Yoshiro
Deparimsnt Of Elecironics Facully Of Engineering Osaka University
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Mitsuishi Tomokuni
Department Of Management And Information Science Jobu University
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OKABE Katsuya
Faculty of Engineering, Gunma University
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SASAKI Yosisato
Faculty of Engineering, Gunma University
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Okabe Katsuya
Faculty Of Engineering Gunma University
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Sasaki Y
Faculty Of Engineering Gunma University
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- Electric Field Effect on the Imaginary Part of the Dielectric Function in Highly Anisotropic Crystals
- Electrical Conduction and Switching in Amorphous Semiconductors
- Gas-Evaporated Small InSb Particles with the Wurtzite Structure
- Electroabsorption of GaS around the Indirect Edge
- Raman Scattering of Gas-Evaporated Ge with a Structure Other Than the Diamond Lattice
- Reduction and Sintering of Vanadium Oxide Films by Laser-Beam Irradiation