Effect of Substrate Inclination on c-Axis Orientation and In-Plane Squareness Ratio in RF-Sputtered Co-Cr Films
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1984-08-20
著者
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Hirono S
Ibaraki Electrical Communications Lab.
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Hirono Shigeru
Ibaraki Electrical Communication Laboratory Nippon Telegraph And Telephone Public Corporation
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Hirono Shigeru
Ibaraki Electrical Communication Laboratory N.t.t.
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Maeda Yasuhi
Ibaraki Electrical Communication Laboratory, Nippon Telegraph and Telephone Public Corporation
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Maeda Yasuhi
Ibaraki Electrical Communication Laboratory Nippon Telegraph And Telephone Public Corporation
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- Room Temperature Formation of Crystallized Palladium Silicide on Si(111) Observed by Ultrahigh Voltage Electron Microscopy : Surfaces, Interfaoes, and Films
- Effect of Substrate Inclination on c-Axis Orientation and In-Plane Squareness Ratio in RF-Sputtered Co-Cr Films
- Preparation of Perpendicular Magnetic Co-Ru Films by an RF Sputtering Method
- Preparation of Perpendicular Magnetic Co-Cr Films by Vacuum Evaporation