High Rate Preparation of a-Si:H by Reactive Evaporation Method
スポンサーリンク
概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1984-03-20
著者
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Myokan Isao
New Materials R&d Laboratries Konishiroku Photo. Ind. Co. Ltd.
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Myokan Isao
New Materials R&d Laboratories Konishiroku Photo Ind. Co. Ltd.
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MANO Shigeru
New Materials R & D Laboratories Konishiroku Photo Ind. Co. Ltd.
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SHIBATA Takuji
New Materials R & D Laboratories Konishiroku Photo Ind. Co. Ltd.
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SATO Shigeru
New Materials R&D Laboratries, Konishiroku Photo. Ind. Co., Ltd.
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Shindo Masanari
New Materials R&D Laboratories, Konishiroku Photo Ind. Co. Ltd.
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Mano Shigeru
New Materials R&D Laboratories, Konishiroku Photo Ind. Co. Ltd.
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Shibata Takuji
New Materials R&D Laboratories, Konishiroku Photo Ind. Co. Ltd.
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Shindo Masanari
New Materials R&D Laboratories, Konishiroku Photo Ind. Co. Ltd.
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Sato Shigeru
New Materials R&D Laboratories, Konishiroku Photo Ind. Co. Ltd.
関連論文
- Bombardment Damage in Reactively-Evaporated a-Si:H
- Preparation Capacity of Reactive Evaporation Method for Amorphous Silicon
- High Rate Preparation of a-Si:H by Reactive Evaporation Method