Effect of Deposition Conditions on Intrinsic Stress in a-Si:H Films

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1983-05-20

著者

• Takagi Nobuyoshi

  Fujitsu Laboratories Ltd.

• Ozawa Kiyoshi

  Fujitsu Laboratories Ltd.

• ASAMA Kunihiko

  Fujitsu Laboratories Ltd.

• Takagi Nobuyoshi

  Fujitsu Laboratories Ltd

関連論文

• Effect of Deposition Conditions on Intrinsic Stress in a-Si:H Films
• Contact-Type Linear Sensor Using Amorphous Si Diode Array : C-3: SENSORS
• Simple Method of Measuring Cubic Anisotropy Constant in [111]-Oriented Garnet Films with a Torque Magnetometer
• A Note on the Estimation of the Bits Density and the Data Rate in Bubble Crystals
• Characterization of 1.5 μm Bubble Devices built on low Magnetization Garnet Films for minimizing Drive Field : C-2: SURFACE WAVE AND MAGNETIC DEVICES
• Influence of Nonstoichiometric Surface Layer on Properties of CdS Films
• Application of Photo-Assisted Etching Technology to Preferential Etching of Si for Dielectrically Isolated Structure

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