Arc Initiation on a Metal Surface Stained by Contamination and Exposed to Plasma
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1983-12-20
著者
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KUDO Kouichi
Department of Electrical Engineering, Fukuoka Institute of Technology
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Kudo Kouichi
Department Of Electrical Engineering Fukuoka Institute Of Technology
関連論文
- Influence of Applying Bias Voltage on Diamond Nucleation while Changing the Experimental Condition
- Characteristics of Nucleation Using the Bias-Enhanced Nucleation Method at Low Pressure
- Characteristics of Nucleation Using the Bias-Enhanced Nucleation Method at Low Pressure
- Effect of Contamination on Arc Initiation on a Metal Surface Exposed to Plasma
- Arc Initiation on a Metal Surface Stained by Contamination and Exposed to Plasma