Silicon Plate Thickness Measurement System Using Near-Infrared Optical Interferometry

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概要

• 論文の詳細を見る

• A simple, noncontact silicon plate thickness measurement system that uses infrared interferometry was demonstrated. Its applicability to samples with various surface conditions was examined.

• 社団法人応用物理学会の論文
• 1999-07-15

著者

• FUJIMOTO Hiroyuki

  National Research Laboratory of Metrology

• Fujimoto Hiroyuki

  National Metrology Institute of Japan, National Institute of Advanced Industrial Science and Technology (NMIJ/AIST), Tsukuba Central 3, 1-1-1 Umezono, Tsukuba, Ibaraki 305-8563, Japan

関連論文

• Absolute Measurement of Lattice Spacing d(220) Silicon Crystal in Floating Zone
• Light Bounces in Two-Beam Scanning Laser Interferometers
• Silicon Plate Thickness Measurement System Using Near-Infrared Optical Interferometry
• Characterization of Wavelength Stability of Dispersive Monolithic Double Channel-Cut Monochromator in Order of $10^{-9}$

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