Charge Exchange Ion Energy Distribution at the RF Electrode in a Plasma Etching Chamber
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概要
- 論文の詳細を見る
Ar ion energy distribution affected by the charge exchange collision in a sheath was measured by an ion energy analyzer in the rf mode at the rf electrode in a plasma etching chamber. Dependence of the energy distribution on Ar gas pressure ranging from 1.4 to 19.3 mTorr was measured. Under high pressure, an extra peak in addition to the saddle-shaped peaks was observed, and the energy distribution of the ions in the low-energy region increased. These experimental features were adequately explained by a simple calculation model. We also calculated energy distributions of neutrals that were generated by the charge exchange collision, and suggested the connection of the high-energy neutrals with the plasma etching process.
- 社団法人応用物理学会の論文
- 1999-07-15
著者
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HAYASHI Toshio
Research and Development Division, ULVAC Japan Ltd.
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Mizutani Naoki
Research & Development Division Ulvac Japan Ltd.
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Hayashi Toshio
Research & Development Division Ulvac Japan Ltd.
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