Influences of Sputtering Power and Substrate Temperature on the Properties of RF Magnetron Sputtered Indium Tin Oxide Thin Films

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1999-06-15

著者

• Loreti S.

  Enea Centro Ricerche Localita Granatello

• Nobile G.

  Enea Centro Ricerche Localita Granatello

• TERZINI E.

  ENEA Centro Ricerche, Localita Granatello

• MINARINI C.

  ENEA Centro Ricerche, Localita Granatello

• POLICHETTI T.

  ENEA Centro Ricerche, Localita Granatello

• THILAKAN P.

  ENEA

• Polichetti T.

  Enea Centro Ricerche Localita Granatello

• Thilakan P

  Nagoya Inst. Technol. Nagoya Jpn

• Minarini C.

  Enea Centro Ricerche Localita Granatello

• Terzini E.

  Enea Centro Ricerche Localita Granatello

関連論文

• Influences of Sputtering Power and Substrate Temperature on the Properties of RF Magnetron Sputtered Indium Tin Oxide Thin Films
• Influences of Sputtering Power and Substrate Temperature on the Properties of RF Magnetron Sputtered Indium Tin Oxide Thin Films

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