Miniature High Intensity Microwave Ion Source

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概要

• 論文の詳細を見る

• A small microwave ion source has been fabricated from a closed magnetic circuit with a gas nozzle placed at one end. The source has an overall length of 25 mm, a diameter of 34 mm, and a mass of about 100 g. The ion beam current is in excess of 0.4 mA at an extraction voltage of 3 kV and at microwave powers of less than 30 W. A low-pressure and high-density microwave ion/plasma source is created. This source is promising for molecular-beam epitaxy (MBE) and other ultra-high-vacuum (UHV) applications.

• 社団法人応用物理学会の論文
• 1999-01-15

著者

• Yoshida Yoshikazu

  Department Of Electrical Engineering Faculty Of Engineering Tohoku University

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• Miniature High Intensity Microwave Ion Source

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