Photosensitive Materials on a Base of Polysiloxane for the Alignment of Nematic Liquid Crystals
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1997-09-15
著者
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Reznikov Yuriy
Institute Of Physics Academy Of Sciences Of Ukraine
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Reznikov Yuriy
Institute Of Physics National Academy Of Sciences Prospect Nauky
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Kim J‐h
Pukyong National Univ. Pusan Kor
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Kim J‐h
Univ. Texas Austin Usa
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KWON Soon
LCD Laboratory, LG Electronics
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YAROSHCHUK Oleg
Institute of Physics, National Academy of Sciences, prospect Nauky
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PELZL Gerhard
Institute of Physical Chemistry, Martin-Luther-University, Muehlpforte
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PIRWITZ Grit
Institute of Physical Chemistry, Martin-Luther-University, Muehlpforte
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ZASCHKE Horst
Institute of Physical Chemistry, Martin-Luther-University, Muehlpforte
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KIM Jong-Hyun
LCD Lab. of LG Electronics
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Pirwitz Grit
Institute Of Physical Chemistry Martin-luther-university Muehlpforte
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Zaschke Horst
Institute Of Physical Chemistry Martin-luther-university Muehlpforte
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Pelzl Gerhard
Institute Of Physical Chemistry Martin-luther-university Muehlpforte
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Kwon Soon
Lcd Lab. Of Lg Electronics
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Yaroshchuk O
Inst. Physics Nasu Kyiv Ukr
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KWON Soon
LCD Lab. LG Electronics Inc.
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- Photosensitive Materials on a Base of Polysiloxane for the Alignment of Nematic Liquid Crystals
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