Zaschke Horst | Institute Of Physical Chemistry Martin-luther-university Muehlpforte
スポンサーリンク
概要
- ZASCHKE Horstの詳細を見る
- 同名の論文著者
- Institute Of Physical Chemistry Martin-luther-university Muehlpforteの論文著者
関連著者
-
Reznikov Yuriy
Institute Of Physics Academy Of Sciences Of Ukraine
-
YAROSHCHUK Oleg
Institute of Physics, National Academy of Sciences, prospect Nauky
-
KIM Jong-Hyun
LCD Lab. of LG Electronics
-
Pirwitz Grit
Institute Of Physical Chemistry Martin-luther-university Muehlpforte
-
Zaschke Horst
Institute Of Physical Chemistry Martin-luther-university Muehlpforte
-
Pelzl Gerhard
Institute Of Physical Chemistry Martin-luther-university Muehlpforte
-
Kwon Soon
Lcd Lab. Of Lg Electronics
-
KWON Soon
LCD Lab. LG Electronics Inc.
-
Reznikov Yuriy
Institute Of Physics National Academy Of Sciences Prospect Nauky
-
Kim J‐h
Pukyong National Univ. Pusan Kor
-
Kim J‐h
Univ. Texas Austin Usa
-
KWON Soon
LCD Laboratory, LG Electronics
-
PELZL Gerhard
Institute of Physical Chemistry, Martin-Luther-University, Muehlpforte
-
PIRWITZ Grit
Institute of Physical Chemistry, Martin-Luther-University, Muehlpforte
-
ZASCHKE Horst
Institute of Physical Chemistry, Martin-Luther-University, Muehlpforte
-
Yaroshchuk O
Inst. Physics Nasu Kyiv Ukr
-
Kim Jong-Hyun
LCD Lab. of LG Electronics, 533 Hogae-dong, Dongan-gu, Anyang-shi, Kyongki-do 430-080, Korea
-
Yaroshchuk Oleg
Institute of Physics, National Academy of Sciences, prospect Nauky, 46, Kyiv, 252022 Ukraine
-
Pelzl Gerhard
Institute of Physical Chemistry, Martin-Luther-University, Muehlpforte, 1, 06108 Halle, Germany
-
Pirwitz Grit
Institute of Physical Chemistry, Martin-Luther-University, Muehlpforte, 1, 06108 Halle, Germany
著作論文
- Photosensitive Materials on a Base of Polysiloxane for the Alignment of Nematic Liquid Crystals
- Photosensitive Materials on a Base of Polysiloxane for the Alignment of Nematic Liquid Crystals