The Analysis of Trace Impurities in Nitrogen Gas by High Pressure Ionization Mass Spectrometry

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概要

• 論文の詳細を見る

• We developed high pressure ionization mass spectrometry (HPIMS) to monitor trace impurities in nitrogen (N_2) gas in order to establish an ultra-high purity (UHP) N_2 supplying technology for ULSI fabrication. We also demonstrated that the oxygen (O_2), carbon dioxide (CO_2) and moisture (H_2O) in N_2 can be measured with a high sensitivity and accuracy using HPIMS. The ion intensities of O_2, CO_2 and H_2O in N_2 with HPIMS was increased about one order of magnitude more than that with atmospheric pressure ionization mass spectrometry (APIMS). The excellent linearity between the ion intensity and O_2 concentration was obtained with a correlation coefficient over 0.9999 in the range from 5 ppb to 50 ppb. The reproducibility and accuracy of measurement could be improved since the pressure of the ionization chamber was controlled precisely by using HPIMS.

• 社団法人応用物理学会の論文
• 1997-11-15

著者

• ISHIHARA Yoshio

  Tsukuba Laboratories, Nippon Sanso Co.

• Ishihara Y

  Hamamatsu Photonics K. K. Shizuoka Jpn

• Ishihara Yoshio

  Tsukuba Laboratories Nippon Sanso Co.

• KIMIJIMA Tetsuya

  Tsukuba Laboratories, Nippon Sanso Corporation

• UMEHARA Hitomi

  Tsukuba Laboratories, NIPPON SANSO Corporation

• NISHINA Akira

  Tsukuba Laboratories, NIPPON SANSO Corporation

• Nishina Akira

  Tsukuba Laboratories Nippon Sanso Corporation

• Umehara Hitomi

  Tsukuba Laboratories Nippon Sanso Corporation

• Kimijima T

  Tsukuba Laboratories Nippon Sanso Corporation

• Kimijima Tetsuya

  Tsukuba Laboratories Nippon Sanso Corporation

• Umehara Hideki

  Tsukuba Laboratories Nippon Sanso Corporation

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