Dry Post-Etch Treatment using SF_6 Chemistry for 0.2 μm Contact Hole
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1995-09-15
著者
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Kim S‐j
National Inst. Material Sci. (nims) Ibaraki Jpn
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KIM Seung-Joon
Hyundai Electronics Co., Semiconductor R&D Div. 1
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SHIN Kisoo
Hyundai Electronics Co., Semiconductor R&D Div. 1
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PARK Hee-Kook
Hyundai Electronics Co., Semiconductor R&D Div. 1
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Shin K
Pohang Univ. Sci. And Technol. Pohang Kor
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Park Hee-kook
Hyundai Electronics Co. Semiconductor R&d Div. 1
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Kim Seung-joon
Hyundai Electronics Co. Semiconductor R&d Div. 1
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SHIN Kisoo
Hyundai Electronics Co., Semiconductor R&D Div. 1