Effects of Silicon Nitride Chemical Composition on Magneto-Optical Properties of Non-Stoichiometric Silicon Nitride/TbFeCo Layers
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概要
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The effects of various silidon nitride chemical compositions on the magneto-optical properties of non-stoichio-metric silicon nitride/TbFeCo layers have been investigated. With increasing pressure of the sputtering gas, stoichiometric Si_3N_4 changes to silicon oxynitride SiON, and with decreasing in the N_2/Ar ratio of the sputtering gas, it changes to nitrogen-defective silicon nitride (SiN_x). The refractive index of films decreases with increasing oxygen concentration, and it increases with decreasing nitrogen concentration. Measured values for Kerr rotation angle and reflectivity of the SiN_x/TbFeCo/SiN_x layers were found to correspond quite well to those derived theoretically. Increase of the oxygen concentration of the SiON layer results in oxidation at the interface, which in turn results in an observable decrease in the Kerr rotation angle of SiON/TbFeCo bilayers. A SiN_x/TbFeCo layer has been found to be just as effective as a Si_3N_4/TbFeCo layer for use in magneto-optical disks.
- 社団法人応用物理学会の論文
- 1995-07-15
著者
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NAKADA Masafumi
Functional Devices Research Laboratories, NEC Corp.
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OKADA Mitsuya
Functional Devices Research Laboratories, NEC Corp.
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Okada Mitsuya
Functional Devices Research Laboratories Nec Corp.
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Nakada Masafumi
Functional Devices Research Laboratories Nec Corp.
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