Three-Dimensional Simulation of Target Erosion in DC Magnetron Sputtering (<Special Issue> Plasma Processing)
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1994-07-30
著者
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Nemoto M
Univ. Tsukuba Tsukuba Sci. City Jpn
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Nomura Takuji
Research Center Asahi Glass Co. Ltd.
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SHIDOJI Eiji
Research Center, Asahi Glass Co., Ltd.
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Shidoji E
Asahi Glass Co. Ltd. Yokohama Jpn
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Shidoji Eiji
Research Center Asahi Glass Co. Ltd.
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NEMOTO Masaharu
Research Center, Asahi Glass Co., Ltd.
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YOSHIKAWA Yukio
Research Center, Asahi Glass Co., Ltd.
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Yoshikawa Y
Research Center Asahi Glass Co. Ltd.
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Nemoto Masaharu
Research Center Asahi Glass Co. Ltd.
関連論文
- Two-Dimensional Self-Consistent Simulation of a DC Magnetron Discharge
- Three-Dimensional Simulation of Target Erosion in DC Magnetron Sputtering ( Plasma Processing)
- Improving Mobility of F-Doped SnO Thin Films by Introducing Temperature Gradient during Low-Pressure Chemical Vapor Deposition