A Consideration of the Deformation of Rectangular Pattern

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概要

• 論文の詳細を見る

• The mechanism of rectangular pattern deformation is studied and methods to realize precise pattern definition are presented. We observed that rectangular pattern deformation strongly depends on the absorbed energy distribution within the resist due to defocusing. Resist thickness thinning and surface image techniques such as DESIRE show promise in realizing precise pattern definition.

• 社団法人応用物理学会の論文
• 1990-11-20

著者

• Shibayama H

  Integrated Circuit Group Sharp Corporation

• Kawabata Ryohei

  Department Of Applied Quantum Physics And Nuclear Engineering Graduate School Of Engineering Kyushu

• TANAKA Hidehito

  Integrated Circuit Group, SHARP Corporation

• OTA Tsuneo

  Integrated Circuit Group, SHARP Corporation

• TANIMOTO Keisuke

  Integrated Circuit Group, SHARP Corporation

• KAWABATA Ryohei

  Integrated Circuit Group, SHARP Corporation

• SHIBAYAMA Hikou

  Integrated Circuit Group, SHARP Corporation

• Kawabata Ryohei

  Integrated Circuit Group Sharp Corporation

• Shibayama Hikou

  Integrated Circuit Group Sharp Corporation

• Ota Tsuneo

  Integrated Circuit Group Sharp Corporation

• Tanimoto Keisuke

  Integrated Circuit Group Sharp Corporation

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