Roughness Assessment of Polysilicon Using Power Spectral Density

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概要

• 論文の詳細を見る

• Atomic force microscopy (AFM) has been used to investigate the surface morphology of polysilicon deposits grown under two different temperature conditions. We also present results obtained with scanning tunneling microscopy (STM) and transmission electron microscopy (TEM). Surface morphology data have been quantitatively analysed and compared using standard roughness criteria such as the root mean square of the surface roughness. Moreover, spatial frequency analysis of roughness power spectrum is used to determine characteristic dimensions in the surface plane.

• 社団法人応用物理学会の論文
• 1993-12-15

著者

• Chollet F

  Univ. Franche‐comte Besancon Fra

• Andre E

  France Telecom Meylan Fra

• Dumas Philippe

  Groupe De Physique Des Etats Condenses-ura Cnrs 783 Faculte Des Sciences De Luminy

• Vatel Olivier

  Centre National D'etudes Des Telecommunications

• CHOLLET Frederic

  Centre National d'Etudes des Telecommunications

• SALVAN Franck

  Groupe de Physique des Etats Condenses-URA CNRS 783, Faculte des Sciences de Luminy

• ANDRE Elie

  Centre National d'Etudes des Telecommunications

• Salvan Franck

  Groupe De Physique Des Etats Condenses-ura Cnrs 783 Faculte Des Sciences De Luminy

• ANDRE Elie

  Centre National d'Etudes des Telecommunications

• CHOLLET Frederic

  Centre National d'Etudes des Telecommunications

関連論文

• Atomic Force Microscopy and Infrared Spectroscopy Studies of Hydrogen Baked Si Surfaces
• Roughness Assessment of Polysilicon Using Power Spectral Density

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