Contribution of Obliquely Scattered Electrons to the Irradiation under the Scanner Window
スポンサーリンク
概要
- 論文の詳細を見る
Directional distribution of electrons has been investigated for the case where they impinge on the sample after passing through the scanner window. A simple theoretical treatment to estimate the fractions of oblique electron flux is given. An experiment has also been made by using electrons of energies 1.5-8 MeV from a Van de Graaff and a linear accelerator. The calculated and the observed results have shown a moderately good agreement, It is to be noted that the contribution of the oblique flux with angle of incidence greater than 5° is about 15-65% under a typical irradiation geometry.
- 社団法人応用物理学会の論文
- 1969-11-05
著者
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ITO Rinsuke
Radiation Center of Osaka Prefecture
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TABATA Tatsuo
Radiation Center of Osaka Prefecture
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Ito Rinsuke
Radiat. Center Osaka Prefect.
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Tabata Tatsuo
Radiat. Center Osaka Prefect.
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OKABE Shigeru
Radiation Center of Osaka Prefecture
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Tsumori Kunihiko
Radiation Center of Osaka Prefecture
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