Molecular Structure and Cracks of Films Formed by Gas Phase Reaction of SiH_4 and NH_3
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- 1968-08-05
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関連論文
- Molecular Structure and Cracks of Films Formed by Gas Phase Reaction of SiH_4 and NH_3
- Measurement of the Distribution of Phosphorus Diffused in Silicon Dioxide Film Using ^P as a Tracer