Measurement of the Distribution of Phosphorus Diffused in Silicon Dioxide Film Using ^<32>P as a Tracer
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1967-03-15
著者
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Yohsida Masayuki
The Electrical Communication Laboratory
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Watanabe Yoshio
The Electrical Communication Laboratory
関連論文
- Molecular Structure and Cracks of Films Formed by Gas Phase Reaction of SiH_4 and NH_3
- Measurement of the Distribution of Phosphorus Diffused in Silicon Dioxide Film Using ^P as a Tracer