Voltage Controlled Negative Resistance (VCNR) in Reactively Sputtered Thin Nb_2O_5 Films
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1968-12-05
著者
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Pinto R.
Tata Institute Of Fundamental Research
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Shaha B.
Tata Institute Of Fundamental Research:g.s. Technological Institute Indore (m.p.)
関連論文
- Getter-Bias Sputtering of High Purity Metal Films in a High Current Vacuum Discharge in the 10^ Torr Range
- Voltage Controlled Negative Resistance (VCNR) in Reactively Sputtered Thin Nb_2O_5 Films