High-Resolution Thick Mask Pattern Fabrication for X-Ray Lithography
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1980-11-05
著者
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Ozawa Akira
Musashino Electrical Communication Laboratory Nippon Telegraph And Telephone Pubulic Corporation
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Ozawa Akira
Musashino Electrical Communication Laboratory N.t.t
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Ono Toshiro
Musashino Electrical Communication Laboratory Nippon Telegraph And Telephone Public Corporation
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Ono Toshiro
Musashino Electrical Communication Laboratory N.t.t
関連論文
- High-Resolution Thick Mask Pattern Fabrication for X-Ray Lithography
- Transparent X-Ray Lithography Masks
- Preparation of X-Ray Lithography Masks with Large Area Sandwich Structure Membrane
- Effect of Dark Space in RF Glow Discharge on Plasma Etching Characteristics