RF Probe Method for Space Potential Measurement in Medium Pressure Plasmas
スポンサーリンク
概要
- 論文の詳細を見る
- 1977-07-05
著者
-
Matsumura Shosaku
Department Of Electrical Engineering Musashi Institute Of Technology
-
Matsumura Shosaku
Department Of Electrical And Electronic Engineering Musashi Institute Of Technology
-
CHEN Sin-Li
Department of Electrical Engineering, Musashi Institute of Technology
-
Chen Sin-li
Department Of Electrical Engineering Musashi Institute Of Technology
関連論文
- Studies on the Measurement of Plasma Parameters by Means of the RF Probe Method
- RF Probe Method for Space Potential Measurement in Medium Pressure Plasmas
- Modelling of Noble Gas-SiH_4 Gas Mixture Glow Discharge Positive Column Plasmas ( Plasma Processing)
- Measurement of Negative Ions Using Improved Probe for Detection of Photodetached Electrons ( Plasma Processing)
- Time-Resolved Measurements of RF Plasmas Using Electrostatic Probe Having Compensation Circuits for Space Potential Fluctuation ( Plasma Processing)
- Negative Ion Density Determination Using Probe to Detect Photo-Detached Electron by Continuous Wave Laser