Optical Imaging Effect of Cr Film
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概要
- 論文の詳細を見る
A new effect which yields high-resolution optical images in chrome films was found. The etch rate for a 200Å-thick Cr film irradiated by a Q-switched ruby laser beam was significantly lower in the illuminated portion than in the unexposed portion. Submicronsize gratings (0.35μm width and spacing) were prepared by this technique using the interference pattern of laser beams. A transient resistance change, as well as a change in electrical resistance after irradiation, was observed. A thermal analysis showed that the temperature at threshold intensity for the imaging effect corresponded to the melting point of Cr, and predicted as well, the observed transient response of the resistance.
- 社団法人応用物理学会の論文
- 1976-06-05
著者
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Osaka Susumu
Rca Research Laboratories Inc.
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TODA Minoru
RCA Research Laboratories, Inc.
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Toda Minoru
Rca Research Laboratories Inc.
関連論文
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