Properties of Vapor Deposited Silicon Nitride Films with Varying Excess Si Content
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概要
- 論文の詳細を見る
- 1973-05-05
著者
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Kobayashi Keizo
I.c. Division Nippon Electric Company Ltd.
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TANABASHI Kyoji
I.C. Division, Nippon Electric Company, Ltd.
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Tanabashi Kyoji
I.c. Division Nippon Electric Company Ltd.
関連論文
- Properties of Vapor Deposited Silicon Nitride Films with Varying Excess Si Content
- Influence of Device Parameters on Memory Performance of MNOS Structure