Influence of Doping Impurities on Stacking Fault Generation in Thermally Oxidized Silicon
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1972-07-05
著者
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Kato Teruo
Semiconductor And Integrated Circuits Division Hitachi Ltd.
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Yoshinaka Akira
Semiconductor And Integrated Circuits Division Hitachi Ltd.
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SUGITA Yoshimitsu
Semiconductor and Integrated Circuits Division, Hitachi, Ltd.
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Sugita Yoshimitsu
Semiconductor And Integrated Circuits Division Hitachi Ltd.