Structual Changes of Arsenic Silicate Glasses with Heat Treatments

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概要

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• Silicate glass containing arsenic as a diffusant into silicon was studied. The glass was deposited on a heated silicon substrate in the atmosphere of mixture of tetra-ethyl ortho-silicate vapor, arsenic trichloride vapor and oxygen gas between 500-700℃. The structure of the glass and its changes with heat treatments in the atmosphere of oxygen, hydrogen, nitrogen gas and in vacuum were studied by infra-red spectroscopy, electron diffraction analysis and so on. Density, mole percentage of As_2O_3 and refractive index were also measured. By the heat treatment in hydrogen gas, As_2O_3 in glass is easily reduced to As and after its treatment, As is oxidized again to As_2O_3 by the heat treatment in oxygen gas. During a long time heat treatment in oxygen gas, the surface of the glass is crystallized. The damage of the glass by the heat treatment in oxygen gas may be explained by the low softening point and large thermal expansion coefficient of this glass.

• 社団法人応用物理学会の論文
• 1970-06-05

著者

• Terunuma Yukio

  Electrical Communication Laboratory

• ARAI Eisuke

  Electrical Communication Laboratory

関連論文

• Evaporation Velocity of Arsenic in Silicon
• Observations of Dislocations in Phosphorus-Diffused Silicon by X-Ray and Etching Techniques
• Structual Changes of Arsenic Silicate Glasses with Heat Treatments

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