The Research of an Instrument for Testing the Optic Point of Fall in the Exposure Platform (情報ディスプレイ--The 6th Asian Symposium on Information Display & Exhibition)

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概要

• 論文の詳細を見る

• An instrument with CCD probe for testing the optic point of fall in the exposure platform was developed in the paper. It is used to measure the offset of optic points of fall on the internal face of screen, which is resulted in the revise of corrector lens. Its measuring precision is 3〜5μm.

• 社団法人映像情報メディア学会の論文
• 2000-10-20

著者

• Ying Gen

  Dept Of Electronic Engineering Tsinghua University

• Wang Jianru

  Dept Of Electronic Engineering Tsinghua University

• Liao HuanLin

  Dept of Electronic Engineering, Tsinghua University

• Ying GenYu

  Dept of Electronic Engineering, Tsinghua University

• Du BingCh

  Dept of Electronic Engineering, Tsinghua University

• Liu JianMou

  IRICO Group

• Li YongJun

  IRICO Group

• Fei MinQuan

  IRICO Group

• Liao Huanlin

  Dept Of Electronic Engineering Tsinghua University

• Ying Genyu

  Dept Of Electronic Engineering Tsinghua University

• Du Bingch

  Dept Of Electronic Engineering Tsinghua University

関連論文

• The Research of an Instrument for Testing the Optic Point of Fall in the Exposure Platform
• The Research of an Instrument for Testing the Optic Point of Fall in the Exposure Platform (情報ディスプレイ--The 6th Asian Symposium on Information Display & Exhibition)
• Analyze and Design of Colour Picture Tube Field Controller (情報ディスプレイ--The 6th Asian Symposium on Information Display & Exhibition)

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