The Research of an Instrument for Testing the Optic Point of Fall in the Exposure Platform

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概要

• 論文の詳細を見る

• An instrument with CCD probe for testing the optic point of fall in the exposure platform was developed in the paper. It is used to measure the offset of optic points of fall on the internal face of screen, which is resulted in the revise of corrector lens. Its measuring precision is 3〜5 μm.

• 社団法人電子情報通信学会の論文
• 2000-10-13

著者

• Li Yong

  Irico Group Xianyang Shannxi Prov

• Liao Huan

  Dept of Electronic Engineering, Tsinghua University

• Wang Jian

  Dept of Electronic Engineering, Tsinghua University

• Ying Gen

  Dept of Electronic Engineering, Tsinghua University

• Du Bing

  Dept of Electronic Engineering, Tsinghua University

• Liu Jian

  IRICO Group, Xianyang, Shannxi Prov

• Fei Min

  IRICO Group, Xianyang, Shannxi Prov

• Du Bing

  Dept Of Electronic Engineering Tsinghua University

• Fei Min

  Irico Group Xianyang Shannxi Prov

• Wang Jian

  Dept Of Electronic Engineering Tsinghua University

• Ying Gen

  Dept Of Electronic Engineering Tsinghua University

• Liao Huan

  Dept Of Electronic Engineering Tsinghua University

• Wang Jianru

  Dept Of Electronic Engineering Tsinghua University

• Liao Huanlin

  Dept Of Electronic Engineering Tsinghua University

• Liu Jian

  Irico Group Xianyang Shannxi Prov

関連論文

• The Research of an Instrument for Testing the Optic Point of Fall in the Exposure Platform
• The Research of an Instrument for Testing the Optic Point of Fall in the Exposure Platform (情報ディスプレイ--The 6th Asian Symposium on Information Display & Exhibition)

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