Advanced PECVD Technolgy for Manufacturing AM LCDs (第5回日韓台中情報ディスプレイ合同研究会(ASID '99)) -- (TFT Technology for AM LCD)
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概要
- 論文の詳細を見る
PECVD is one of the most critical technologies for manufacturing AM LCD devices. Advanced PECVD systems have been developed for low temperature deposition of a-Si, SiNx, SiO_2, SiON, and n+Si films. Typically, cluster tool configurations are used since they provide excellent process control with single substrateprocessing and flexible process flows. Recent reports indicate that good polysilicon TFTs have been manufactured using laser crystallization of a-Si precursor films. This paper will review the development of PECVD systems for volume manufacturing of LCDs and discuss process technology and requirements for future manufacturing.
- 社団法人映像情報メディア学会の論文
- 1999-03-19
著者
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Law Kam
Applied Komatsu Technology
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Tsai Chuang-chuang
Applied Komatsu Technology
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Shang Quanyuan
Applied Komatsu Technology
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Takehara Takako
Applied Komatsu Technology
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Harshbarger william
Applied Komatsu Technology
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Tsai Chuang-Chuan
Applied Komatsu Technology
関連論文
- Advanced PECVD Technolgy for Manufacturing AM LCDs (第5回日韓台中情報ディスプレイ合同研究会(ASID '99)) -- (TFT Technology for AM LCD)
- Advanced PECVD Technology for Manufacturing AM LCDS