Advanced PECVD Technology for Manufacturing AM LCDS

概要

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PECVD is one of the most critical teehnologies for manufacturing AM LCD devices. Advaneed PECVD systems have been developed for low temperature deposition of a-Si, SiNx. SiO_2, SiON, and n+Si films. Typically, cluster tool configurations are used since they provide excellent process control with single substrate processing and flexible process flows. Recent reports indicate that good polysilicon TFTS have been manufactured using laser crystallization of a-Si precursor films. This paper will review the development of PECVD systems for volume manufacturing of LCDS and discuss process technology and requirements for futurc manufacturing.
社団法人電子情報通信学会の論文
1999-03-19