Deposition of Polymeric Thin Films by Ionization-Assisted Method (Special Issue on Organic Molecular Electronics for the 21st Century)

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概要

• 論文の詳細を見る

• Polymeric thin films can be prepared by physical vapor deposition in several manners such as direct evaporation of the polymer, co-evaporation of two monomers followed by polyaddition or polycondensation reaction, or evaporation of single monomer followed by chain polymerization. The ionization-assisted deposition (IAD) was proposed as a new method of polymer deposition that has special features such as activation of polymerization reaction and aligning of the dipole orientation. These mechanisms were utilized for the formation of vinyl polymer and polyurea thin films aiming for such applications as organic light emitting diodes and piezoelectric devices.

• 社団法人電子情報通信学会の論文
• 2000-07-25

著者

• Usui Hiroaki

  The Department Of Material Systems Engineering Tokyo University Of Agriculture And Technology

関連論文

• Deposition of Polymeric Thin Films by Ionization-Assisted Method (Special Issue on Organic Molecular Electronics for the 21st Century)
• Characteristics of Polytetrafluoroethylene Thin Films Prepared by Ionization-Assisted Deposition(Special Issue on Organic Materials for Optics and Electronics)

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